Track planning method for chemical milling evolution-oriented laser engraving process

The invention discloses a track planning method for a chemical milling evolution-oriented laser engraving process, and belongs to a laser surface manufacturing technology. The method is technically characterized by comprising the following steps: selecting a three-dimensional digital-analog expected...

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Bibliographische Detailangaben
Hauptverfasser: SUN PENGPENG, WANG JIAN, LIU QIANG, ZANG CHENXIN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a track planning method for a chemical milling evolution-oriented laser engraving process, and belongs to a laser surface manufacturing technology. The method is technically characterized by comprising the following steps: selecting a three-dimensional digital-analog expected point for second-time etching of a chemical milling part based on two-time chemical milling evolution; selecting a second-time laser engraving position point based on chemical milling evolution; selecting a three-dimensional digital-analog first-time laser engraving expected point of the chemical milling part; selecting a first-time laser engraving position point; carrying out rule feature oriented track planning; and carrying out free curve feature-oriented track planning. According to the method, variable-erosion-ratio laser engraving track planning based on chemical milling evolution is established, the intelligent generation problem of the laser engraving track under different erosion ratio conditions/differen