STAINLESS STEEL MEMBER AND PRODUCTION METHOD THEREOF

The purpose of the present invention is to provide a stainless steel member and a production method thereof, said stainless steel member having a passivation layer formed on a surface of a base material formed from stainless steel, wherein the film thickness of the passivation layer is 2-20 nm, and...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NAKAMURA YUMIKO, SERA AKIRA, NAKATANI MICHIHITO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The purpose of the present invention is to provide a stainless steel member and a production method thereof, said stainless steel member having a passivation layer formed on a surface of a base material formed from stainless steel, wherein the film thickness of the passivation layer is 2-20 nm, and the concentration of chromium atoms in the outermost surface of the passivation layer is 0.1-2.3 byatomic percentage. Also provided are a device or container, the liquid-contact part of which in contact with a semiconductor treatment liquid is formed from the stainless steel member, a semiconductortreatment liquid production method for producing the semiconductor treatment liquid by using the device, and a semiconductor treatment liquid storage method for storing the semiconductor treatment liquid in the container. 本发明提供不锈钢部件及其制造方法,所述不锈钢部件在由不锈钢形成的母材表面形成有钝化层,且钝化层的膜厚为2~20nm,钝化层的最表面的铬原子的原子浓度为0.1~2.3原子%。另外,提供由该不锈钢部件构成与半导体处理液接触的接液部的装置或容器、使用该装置来制造半导体处理液的半导体处理液的制造方法及在该容器中贮藏半导体处理液的半导体处理液的贮藏方法。