Sensitive skin repairing composition and preparation method thereof

The invention discloses a sensitive skin repairing composition and a preparation method thereof. The sensitive skin repairing composition comprises the following raw materials in percentage by weight:0.1 to 5 percent of compound plant extract, 0.01 to 0.04 percent of capryloyl hydroxamic acid, 0.1 t...

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1. Verfasser: DENG SHICHUN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a sensitive skin repairing composition and a preparation method thereof. The sensitive skin repairing composition comprises the following raw materials in percentage by weight:0.1 to 5 percent of compound plant extract, 0.01 to 0.04 percent of capryloyl hydroxamic acid, 0.1 to 0.4 percent of 1, 2-hexanediol and the balance of small molecular group water. By adopting mild and safe raw materials and taking the small molecular group water, a dendrobium officinale extract, a scutellaria baicalensis root extract, a calendula extract and a chondrus crispus extract are in synergetic effect to effectively repair sensitive skin, conditioning acne skin, repairing hormone face and relieving after-sun symptoms. 本发明公开了一种敏感肌修复组合物及其制备方法。该敏感肌修复组合物包括如下按重量百分比计的原料:复合植物提取物0.1~5%、辛酰羟肟酸0.01~0.04%、1,2-己二醇0.1~0.4%、小分子团水余量;本发明采用温和安全的原料,以小分子团水作为溶剂,铁皮石斛提取物、黄芩根提取物、金盏花提取物、皱波角叉菜提取物协同作用,能有效修护敏感肌肤,调理痘肌,修护激素脸,舒缓晒后症状。