A MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

A measurement apparatus (10) and method for determining a substrate grid describing a deformation of a substrate (12) prior to exposure of the substrate (12) in a lithographic apparatus (LA) configured to fabricate one or more features on the substrate (12). Position data for a plurality of first fe...

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Bibliographische Detailangaben

Hauptverfasser:	ZHANG YOUPING, HULSEBOS EDO M, MEGENS HENRICUS J L, BIJNEN FRANCISCUS G C, SOCHA ROBERT JOHN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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