Metal ion monitoring system
The invention discloses a metal ion monitoring system, which comprises a sampling module used for obtaining a sample of a cleaning reagent from a cleaning tank of cleaning equipment at preset time intervals; a detection module which is used for detecting the concentration of metal ions in the sample...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a metal ion monitoring system, which comprises a sampling module used for obtaining a sample of a cleaning reagent from a cleaning tank of cleaning equipment at preset time intervals; a detection module which is used for detecting the concentration of metal ions in the sample through differential pulse anodic stripping voltammetry; and a feedback module which is used for feeding back metal ion concentration. According to the invention, a sample of a cleaning reagent is obtained from a cleaning tank of the cleaning equipment at preset time intervals through the samplingmodule; the detection module is used for detecting the concentration of metal ions in a sample through differential pulse anodic stripping voltammetry; the feedback module feeds back the concentrationof the metal ions, due to the fact that sampling detection is carried out every other preset time period, and the differential pulse anodic stripping voltammetry with short time consumption is adopted, the metal ions of the c |
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