High-flux plasma discharge device and hydrogen sulfide decomposition method
The invention relates to the field of plasma chemistry, and discloses a high-flux plasma discharge device and a hydrogen sulfide decomposition method. The high-flux plasma discharge device comprises afirst cavity (1), and a second cavity (2) and a third cavity (6) respectively nested inside and outs...
Gespeichert in:
Hauptverfasser: | , , , , , , , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention relates to the field of plasma chemistry, and discloses a high-flux plasma discharge device and a hydrogen sulfide decomposition method. The high-flux plasma discharge device comprises afirst cavity (1), and a second cavity (2) and a third cavity (6) respectively nested inside and outside the first cavity (1); the high-flux plasma discharge device further comprises a high-voltage electrode (3) and a grounding electrode (4) which are arranged in the first cavity (1), and a blocking medium which is arranged on the outer surface of the high-voltage electrode (3) and/or the grounding electrode (4). The plasma discharge device provided by the invention has the advantages of high hydrogen sulfide conversion rate, low energy consumption and capability of realizing high-flow hydrogen sulfide treatment.
本发明涉及等离子体化学领域,公开了一种高通量等离子体放电装置和分解硫化氢的方法,包括:第一空腔(1),分别嵌套在第一空腔(1)的内部和外部的第二空腔(2)和第三空腔(6);设置在第一空腔(1)中的高压电极(3)和接地电极(4),阻挡介质,阻挡介质设置在所述高压电极(3)和/或所述接地电极(4)的外表面。本发明提供的等离子体放电装置具有硫化氢转化率高、能耗低以及能够实现大流量硫化氢处理的优点。 |
---|