High-flux plasma discharge device and hydrogen sulfide decomposition method

The invention relates to the field of plasma chemistry, and discloses a high-flux plasma discharge device and a hydrogen sulfide decomposition method. The high-flux plasma discharge device comprises afirst cavity (1), and a second cavity (2) and a third cavity (6) respectively nested inside and outs...

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Hauptverfasser: GUAN YINXIA, WANG LIN, ZHU YUNFENG, REN JUNPENG, LIU QUANZHEN, ZHANG JING, ZHOU MINGCHUAN, ZHANG SHUCAI, SUN FENG, SHI NING, WANG SHIQIANG, ZHANG TIE, LI YAHUI, TANG SHIYA, XU WEI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention relates to the field of plasma chemistry, and discloses a high-flux plasma discharge device and a hydrogen sulfide decomposition method. The high-flux plasma discharge device comprises afirst cavity (1), and a second cavity (2) and a third cavity (6) respectively nested inside and outside the first cavity (1); the high-flux plasma discharge device further comprises a high-voltage electrode (3) and a grounding electrode (4) which are arranged in the first cavity (1), and a blocking medium which is arranged on the outer surface of the high-voltage electrode (3) and/or the grounding electrode (4). The plasma discharge device provided by the invention has the advantages of high hydrogen sulfide conversion rate, low energy consumption and capability of realizing high-flow hydrogen sulfide treatment. 本发明涉及等离子体化学领域,公开了一种高通量等离子体放电装置和分解硫化氢的方法,包括:第一空腔(1),分别嵌套在第一空腔(1)的内部和外部的第二空腔(2)和第三空腔(6);设置在第一空腔(1)中的高压电极(3)和接地电极(4),阻挡介质,阻挡介质设置在所述高压电极(3)和/或所述接地电极(4)的外表面。本发明提供的等离子体放电装置具有硫化氢转化率高、能耗低以及能够实现大流量硫化氢处理的优点。