Solar cell single-sided texturing process utilizing mask protection
The invention discloses a solar cell single-sided texturing process utilizing mask protection. The process comprises the steps of (1) performing alkali texturing on a silicon wafer to form antireflection textured surfaces on the front surface and the back surface of the silicon wafer; (2) placing th...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a solar cell single-sided texturing process utilizing mask protection. The process comprises the steps of (1) performing alkali texturing on a silicon wafer to form antireflection textured surfaces on the front surface and the back surface of the silicon wafer; (2) placing the silicon wafer in a furnace tube for thermal diffusion, and forming oxide layers on the front surface and the back surface of the silicon wafer; (3) protecting the oxide layer on the front surface of the silicon wafer, removing a PN junction and the oxide layer on the back surface, and removing theantireflection suede on the back surface; and (4) performing alkali texturing on the silicon wafer, forming an antireflection textured surface on the back surface of the silicon wafer, and removing the oxide layer on the front surface of the silicon wafer to finish single-sided texturing of the solar cell. According to the invention, the oxide layers formed by thermal diffusion are used as masks;single-side texturing of |
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