Negative photosensitive resin composition and application thereof

The invention relates to a negative photosensitive resin composition. The negative photosensitive resin composition comprises (A) 10 to 50 weight percent of a polysiloxane compound which is prepared by polymerizing a plurality of monomers, wherein the monomers comprise siloxane monomers shown as the...

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Bibliographische Detailangaben
Hauptverfasser:	LIN FANSEN, ZHANG GUIJIA, LAN DAJUN, ZHANG ZHIYI, XU RUOBEI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADVERTISING APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON CRYPTOGRAPHY DISPLAY DISPLAYING EDUCATION ELECTROGRAPHY HOLOGRAPHY LABELS OR NAME-PLATES MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEALS SIGNS THEIR PREPARATION OR CHEMICAL WORKING-UP
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