Plasma-based ship tail gas desulfurization and denitrification system and method

The invention relates to the technical field of ship tail gas treatment, in particular to a plasma-based ship tail gas desulfurization and denitrification system and method. The ship tail gas desulfurization and denitrification system comprises a first-stage low-temperature plasma reaction device, a...

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Hauptverfasser: YUE PUJIE, BAI YUYONG, JING YACHAO, MENG LEI, GU XIAOBING, PENG DAIJUN, LI BENFENG, LI YEHONG, DU MINGSHENG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention relates to the technical field of ship tail gas treatment, in particular to a plasma-based ship tail gas desulfurization and denitrification system and method. The ship tail gas desulfurization and denitrification system comprises a first-stage low-temperature plasma reaction device, a washing device, a second-stage low-temperature plasma reaction device, an SCR denitrification device and a urea pyrolysis device, wherein the primary low-temperature plasma reaction device, the washing device, the secondary low-temperature plasma reaction device and the SCR denitration device are sequentially connected end to end; and the gas output end of the urea pyrolysis device is respectively communicated with the primary low-temperature plasma reaction device and the SCR denitration device. According to the system, the problems of blockage and inactivation of the SCR denitration device can be solved through wet flue gas washing desulfurization treatment, the reaction activity of pollutants is improved throug