Antireflection film grating structure, electroluminescent device and manufacturing method of electroluminescent device

The invention relates to an antireflection film grating structure, an electroluminescent device and a manufacturing method of the electroluminescent device. According to the antireflection film grating, an antireflection combined film is formed by arranging high-refractive-index dielectric layers and low-refractive-index dielectric layers which are sequentially stacked and alternately arranged; constructive interference is formed by mutual stacking of two beams of reflected light reflected by the upper surfaces and the lower surfaces of the corresponding dielectric layers, so that the reflected light is enhanced; And a plurality of light-transmitting slits are arranged in the antireflection combined film to form the grating, so that a part of light enters the light-transmitting slits and is reflected by the reflection structure layer, the reflected light and the light reflected by the plurality of the dielectric layers form two adjacent beams of light, and the two beams of light synchronously grow to form bri