Lithographic cluster, lithographic apparatus, and device manufacturing method

A lithographic cluster includes a track unit and a lithographic apparatus. The lithographic apparatus includes an alignment sensor and at least one controller. The track unit is configured to processa first lot and a second lot. The lithographic apparatus is operatively coupled to the track unit. The alignment sensor is configured to measure an alignment of at least one alignment mark type of a calibration wafer. At least one controller is configured to determine a correction set for calibrating the lithographic apparatus based on the measured alignment of the at least one alignment mark typeand apply first and second weight corrections to the correction set for processing the first and second lots, respectively, such that overlay drifts or jumps during processing the first and second lots are mitigated. 一种光刻簇包括轨道单元和光刻设备。该光刻设备包括对准传感器和至少一个控制器。该轨道单元被配置为处理第一批次和第二批次。该光刻设备可操作地耦接到该轨道单元。该对准传感器被配置为测量校准晶片的至少一个对准标记类型的对准。至少一个控制器被配置为基于所测量的该至少一个对准标记类型的对准来确定用于校准该光刻设备的校正集合，并且将第一权重校正和第二权重校正应用于该校正集合，以用于分别处理该第一批次和该第二批次，以便使得在处理