A method for cleaning a substrate processing apparatus
A method of cleaning blind spots around a substrate supporting apparatus by controlling a position of the substrate supporting apparatus includes moving the substrate supporting apparatus relative toa ring and supplying a cleaning gas to an upper space of the substrate supporting apparatus. 一种通过控制基板...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | A method of cleaning blind spots around a substrate supporting apparatus by controlling a position of the substrate supporting apparatus includes moving the substrate supporting apparatus relative toa ring and supplying a cleaning gas to an upper space of the substrate supporting apparatus.
一种通过控制基板支撑装置的位置来清洁基板支撑装置周围的盲点的方法，该方法包括相对于环移动基板支撑装置并将清洁气体供应到基板支撑装置的上空间。 |
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