Method for forming silicon-based laminate and method for manufacturing silicon-based solar cell

The invention provides a method for forming a silicon-based laminate, which comprises the following steps of: providing a silicon substrate with a first surface and a second surface which are oppositeto each other, forming a first thin film layer on the first surface, forming a second thin film laye...

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Bibliographische Detailangaben
Hauptverfasser: YE CHANGXIN, WU YIDE, TIAN WEICHEN, HONG ZHENGYUAN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a method for forming a silicon-based laminate, which comprises the following steps of: providing a silicon substrate with a first surface and a second surface which are oppositeto each other, forming a first thin film layer on the first surface, forming a second thin film layer on the second surface, and performing microwave processing on the silicon substrate, the first thin film layer and the second thin film layer to passivate the first thin film layer and the second thin film layer. The invention also provides a method for manufacturing the silicon-based solar cell. 本发明提供一种硅基叠层的形成方法,其包括提供硅基板,其中硅基板具有相对的第一表面与第二表面。于第一表面上形成第一薄膜层。于第二表面上形成第二薄膜层。对硅基板、第一薄膜层及第二薄膜层进行微波制程,以钝化第一薄膜层及第二薄膜层。一种硅基太阳能电池的制造方法也被提出。