High-pressure cleaning device for gas-phase reaction of screen under high temperature

The invention relates to a high-pressure cleaning device for a gas-phase reaction of a screen under a high temperature. The high-pressure cleaning device comprises a rack, a containing part allowing aspreading and diffusion plate to be vertically arranged is arranged in the middle of the rack, clean...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHU DONGHAI, GAO SHENGGEN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BLASTING CLEANING CLEANING IN GENERAL DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM HEATING LIGHTING MECHANICAL ENGINEERING PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING WEAPONS
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