High-pressure cleaning device for gas-phase reaction of screen under high temperature

The invention relates to a high-pressure cleaning device for a gas-phase reaction of a screen under a high temperature. The high-pressure cleaning device comprises a rack, a containing part allowing aspreading and diffusion plate to be vertically arranged is arranged in the middle of the rack, cleaning units are arranged on the two sides of the containing part and comprise steel frames arranged parallel to the vertically-arranged spreading and diffusion plate, transmission mechanisms are arranged on the steel frames and each comprise vertical rods arranged parallel to the vertically-arrangedspreading and diffusion plate and a horizontal guide rod located between the vertical rods, the horizontal guide rods can move up and down in the arranging direction of the vertical rods, sliding blocks are arranged on the horizontal guide rods, the sliding blocks can move back and forth in the rod length direction of the horizontal guide rods, spray head assemblies are arranged on the sliding blocks and comprise a plurali