Method for forming semiconductor device

A method for forming a semiconductor device includes depositing a hard mask layer on a metal layer, depositing a first patterned layer on the hard mask layer, forming a first set of sidewall spacers on sidewalls of features of the first patterned layer, forming a second set of sidewall spacers on si...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIAO YUIEH, WU CHIA-TIEN, CHUANG CHENGI, YANG TAI-I, CHEN HSIN-PING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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