Metal oxide film patterning method and application

The invention relates to a metal oxide film patterning method and application. The metal oxide film patterning method comprises the following steps: providing a mixed solution which comprises a metaloxide precursor and a [beta] diketone compound; providing a substrate, depositing the mixed solution...

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1. Verfasser: KE QIUTAN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention relates to a metal oxide film patterning method and application. The metal oxide film patterning method comprises the following steps: providing a mixed solution which comprises a metaloxide precursor and a [beta] diketone compound; providing a substrate, depositing the mixed solution on the surface of the substrate, and carrying out ultraviolet irradiation treatment or O2 plasma treatment to form an intermediate patterned film layer; and performing annealing treatment on the intermediate patterned film layer to obtain a metal oxide film layer. According to the metal oxide filmpatterning method, substances with high chemical toxicity, such as photoresist, do not need to be used, safety and environmental protection are achieved, and the technological process is saved. 本发明涉及金属氧化物薄膜图案化的方法及应用。所述金属氧化物薄膜图案化的方法,包括以下步骤:提供混合溶液,所述混合溶液包括金属氧化物前驱体和β二酮类化合物;提供衬底,在所述衬底表面沉积所述混合溶液,进行紫外光照射处理或O等离子体处理,形成中间图案化薄膜层;对所述中间图案化薄膜层进行退火处理,得到金属氧化物薄膜层。上述金属氧化物薄膜图案化的方法,无需使用光刻胶等化学毒性大的物质,安全环保,节省工艺制程。