Scattering parameter measuring method and filter structure
The embodiment of the invention provides a scattering parameter measurement method and a filter structure, and the method comprises the steps: setting a peripheral circuit connected to a grounding endof a to-be-measured filter so as to form an equivalent grounding potential corresponding to the grou...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The embodiment of the invention provides a scattering parameter measurement method and a filter structure, and the method comprises the steps: setting a peripheral circuit connected to a grounding endof a to-be-measured filter so as to form an equivalent grounding potential corresponding to the grounding end on the peripheral circuit; and collecting scattering parameters of the to-be-measured filter through a measuring probe connected to a signal end of the to-be-measured filter and the equivalent grounding potential on the peripheral circuit. According to the measurement scheme, parameter measurement is carried out by combining the peripheral circuit and the measurement probe, the influence on filter parameter measurement due to the introduction of other equipment parameters is avoided,and the accuracy of the measured filter scattering parameters is improved.
本申请实施例提供一种散射参数的测量方法和滤波器结构,该测量方法通过设置连接至待测滤波器的接地端的外围电路,以在外围电路上形成接地端对应的等效接地电位。并通过连接至待测滤波器的信号端以及外围电路上的等效接地电位的测量探针,采集待测滤波器的散射参数。该测量方案通过结合外围电路以及测量探针进行参数测量,避免 |
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