Waste gas treatment device and method for trichlorosilane production
The invention relates to a waste gas treatment device and method for trichlorosilane production. The device comprises a leaching tower, wherein a gas inlet pipe is arranged at the side end of the leaching tower; a gas outlet is formed in the upper end of the leaching tower; the lower end of the leac...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a waste gas treatment device and method for trichlorosilane production. The device comprises a leaching tower, wherein a gas inlet pipe is arranged at the side end of the leaching tower; a gas outlet is formed in the upper end of the leaching tower; the lower end of the leaching tower is provided with a water outlet pipe; the leaching tower is connected with a foam scraping pool through a water outlet pipe; a plurality of spraying devices are arranged in the leaching tower; a clear liquid pool is arranged at the side end of the foam scraping pool; sludge pipe is arranged at the lower end of the foam scraping pool; a filter screen is arranged between the foam scraping pool and the clear liquid pool; a clear liquid pipe is arranged in the clear liquid pool; the clearliquid pipe communicates with a spraying device through a liquid inlet pipe; a booster pump is arranged on the clear liquid pipe; the sludge pipe is connected with the sludge tank through a sludge pump; a stirring device is |
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