VAPOR DEPOSITION MASK AND VAPOR DEPOSITION MASK MANUFACTURING METHOD

In the present invention, first regions (YA1) in an effective section (YA) formed in a mask sheet (15) are provided for each of active regions (3) of a substrate to be vapor-deposited and have a shapecorresponding to each of the active regions (3). Second regions (YA2) of the effective section (YA)...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	NISHIGUCHI MASAO, YAMABUCHI KOJI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	In the present invention, first regions (YA1) in an effective section (YA) formed in a mask sheet (15) are provided for each of active regions (3) of a substrate to be vapor-deposited and have a shapecorresponding to each of the active regions (3). Second regions (YA2) of the effective section (YA) are outside the first regions (YA1), and a plurality of vapor deposition holes (H) are shielded bya howling sheet (13). 掩模片(15)上所形成的有效部(YA)中的第一区域(YA1)针对被蒸镀基板的每个有源区域(3)而设且形状与有源区域(3)对应，有效部(YA)的第二区域(YA2)位于第一区域(YA1)外，并由支撑条(13)遮蔽多个蒸镀孔(H)。