METHOD TO DETERMINE A PATTERNING PROCESS PARAMETER

A method to determine a patterning process parameter, the method comprising: for a target, calculating a first value for an intermediate parameter from data obtained by illuminating the target with radiation comprising a central wavelength; for the target, calculating a second value for the intermediate parameter from data obtained by illuminating the target with radiation comprising two differentcentral wavelengths; and calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter. 一种用于确定图案化过程参数的方法，该方法包括：针对目标，从利用包括中心波长的辐射照射该目标所获得的数据计算中间参数的第一值；针对该目标，从利用包括两种不同中心波长的辐射照射该目标所获得的数据计算该中间参数的第二值；并且基于该中间参数的第一值和第二值计算图案化过程参数的组合测量。