High temperature coatings for a preclean and etch apparatus and related methods

The invention discloses high temperature coatings for a preclean and etch apparatus and related methods. A pre-clean/etch apparatus comprising: a reaction chamber; a wafer holder; a gas transport path; a gas distribution device; a gas manifold; and a remote plasma unit; at least one of the wafer hol...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GAO PEIPEI, WANG WENTAO, NAGARAJ PRAJWAL, DEMOS ALEXANDROS, WEI CHUANG, LIN XING, MA MINGYANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!