ELECTROSTATIC CHUCK

An electrostatic chuck is disclosed. The electrostatic chuck includes a base, a cushion layer on the base, an electrode layer on the cushion layer, and a dielectric layer on the electrode layer, the base, the cushion layer, the electrode layer, and the dielectric layer have through holes. The throug...

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Bibliographische Detailangaben
Hauptverfasser: BAE MIN HO, YOUN TAE HO, KWON HYOK KEO SE
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:An electrostatic chuck is disclosed. The electrostatic chuck includes a base, a cushion layer on the base, an electrode layer on the cushion layer, and a dielectric layer on the electrode layer, the base, the cushion layer, the electrode layer, and the dielectric layer have through holes. The through holes each have a rectangular shape, and each corner region of the dielectric layer has a pair ofthe through holes, and the central axes of the pair of the through holes respectively intersect two adjacent sides of the dielectric layer at the respective corner region. 公开了静电吸盘。静电吸盘包括基底、位于基底上的垫层、位于垫层上的电极层以及位于电极层上的介电层,基底、垫层、电极层和介电层具有通孔。通孔各自具有矩形形状,并且介电层的每个拐角区域具有一对通孔,且一对通孔的中央轴线分别与介电层的位于相应的拐角区域处的两个邻边交叉。