Substrate mount
A substrate mount for a plasma processing apparatus comprising: a frame; an aperture within the frame, configured to accommodate an insert, the insert being configured to support a substrate for processing by the plasma processing apparatus; a releasable securing mechanism configured to releasably s...
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| Hauptverfasser: | , , |
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | A substrate mount for a plasma processing apparatus comprising: a frame; an aperture within the frame, configured to accommodate an insert, the insert being configured to support a substrate for processing by the plasma processing apparatus; a releasable securing mechanism configured to releasably secure the insert within the aperture such that the insert can be replaced.
一种用于等离子体处理装置的基板底座，包括：框架；框架内的孔，其被构造成容纳插件，插件被构造成支撑基板，所述基板用于通过供等离子体处理装置处理；可释放的固定机构，其被构造成将插件可释放地固定在所述孔内，使得可以更换所述插件。 |
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