QUICK ADJUSTMENT OF METROLOGY MEASUREMENT PARAMETERS ACCORDING TO PROCESS VARIATION
Methods applicable in metrology modules and tools are provided, which enable adjusting metrology measurement parameters with respect to process variation, without re-initiating metrology recipe setup.Methods comprise, during an initial metrology recipe setup, recording a metrology process window and...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Methods applicable in metrology modules and tools are provided, which enable adjusting metrology measurement parameters with respect to process variation, without re-initiating metrology recipe setup.Methods comprise, during an initial metrology recipe setup, recording a metrology process window and deriving baseline information therefrom, and during operation, quantifying the process variation with respect to the baseline information, and adjusting the metrology measurement parameters within the metrology process window with respect to the quantified process variation. The quick adjustment of metrology parameters avoids metrology-related process delays and releases prior art bottlenecks related thereto. Models of effects of various process variation factors on the metrology measurementsmay be used to enhance the derivation of required metrology tuning and enable their application with minimal delays to the production process.
本发明提供计量模块及工具中可应用的方法,其实现相对于工艺变化调整计量测量参数而不重启计量配方设置。方法包括:在初始计量配方设置期间,记录计量过程窗且从其导出基线信息; |
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