ELECTRON BEAM INSPECTION APPARATUS STAGE POSITIONING

An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the ele...

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Hauptverfasser: RONDE MICHAEL JOHANNES CHRISTIAAN, VAN DE RIJDT JOHANNES HUBERTUS ANTONIUS, HEMPENIUS PETER PAUL, BOSCH NIELS JOHANNES MARIA, ARENDS ANTONIUS HENRICUS, BUTLER HANS, VAN DE GROES HENRICUS MARTINUS JOHANNES, VAN KEMPEN ROBERTUS JACOBUS THEODORUS, TSENG KUO-FENG, BAGGEN MARCEL KOENRAAD MARIE, KUINDERSMA LUCAS
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuatorexerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in responseto the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction. 一种电子束设备包括:用于生成电子束的电子光学系统;用于将样本保持在目标位置,使得样本的目标部分被电子束照射的载物台;以及用于将载物台相对于电子束移位的定位装置。定位装置包括台架致动器和平衡质量体。台架致动器将力施加到载物台上来使得载物台加速。施加到载物台上的力导致施加到平衡质量体上的反作用力。平衡质量体响应于反作用力而移动。定位装置使得平衡质量体能够响应于反作用力在第一方向上的分量而在第一方向上移动。