METHODS AND PATTERNING DEVICES AND APPARATUSES FOR MEASURING FOCUS PERFORMANCE OF A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD

Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatusto print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus- dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom. 公开了一种测量光刻装置的焦点性能的方法以及对应的图案化设备和光刻装置。该方法包括使用光刻装置印刷一个或多个第一印刷结构和第二印刷结构。第一印刷结构通过具有第一非远心度的照射印刷，而第二印刷结构通过具有不同于所述第一非远心度的第二非远心度的照射印刷。测量与所述衬底上的第一印刷结构和第二印刷结构之间的焦点相关位置偏移有关的焦点相关参数，并由此得到至少部分基于焦点相关参数的焦点性能的测量。