VACUUM EVAPORATION SOURCE

The technical objective of the present invention is to provide a vacuum evaporation source which has a heating wire having enhanced straightness. To this end, a vacuum evaporation source of the present invention comprising a crucible comprises: a first heating wire for heating the crucible; and a fi...

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Bibliographische Detailangaben
1. Verfasser:	HWANG DO WEON
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The technical objective of the present invention is to provide a vacuum evaporation source which has a heating wire having enhanced straightness. To this end, a vacuum evaporation source of the present invention comprising a crucible comprises: a first heating wire for heating the crucible; and a first upper-part fixing portion for fixing the upper part of the first heating wire. 本发明的目的是提供能够改善加热线的平直度的真空蒸发源。为此，本发明的方面提供了包括坩埚的真空蒸发源，所述真空蒸发源包括用于加热所述坩埚的第一加热线和用于固定所述第一加热线的上部部分的第一上部固定部分。