Method of adapting feed-forward parameters

Disclosed herein is a method for correcting values of one or more feed-forward parameters used in a process of patterning substrates, the method comprising: obtaining measured overlay and/or alignmenterror data of a patterned substrate; calculating one or more correction values for the one or more f...

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Bibliographische Detailangaben
Hauptverfasser:	CEKLI HAKKI, ERDAMAR AHMET KORAY, YAGUBIZADE HADI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed herein is a method for correcting values of one or more feed-forward parameters used in a process of patterning substrates, the method comprising: obtaining measured overlay and/or alignmenterror data of a patterned substrate; calculating one or more correction values for the one or more feed-forward parameters in dependence on the measured overlay and/or alignment error data. 本发明披露了一种用于校正在图案化衬底的过程中使用的一个或更多个前馈参数的值的方法，所述方法包括：获得形成图案后的衬底的被测量的重叠和/或对准误差数据；依赖于所述被测量的重叠和/或对准误差数据来计算用于所述一个或更多个前馈参数的一个或更多个校正值。