MICROREPLICATED POLISHING SURFACE WITH ENHANCED CO-PLANARITY

An article includes a polishing layer that includes a plurality of raised cells separated by a plurality of channels. Each of the plurality of raised cells includes a microstructured working surface,a substantially vertical channel surface, and an offset surface between an edge of the working surface and an upper edge of the channel surface. The microstructured working surface includes a plurality of microstructures. Tops of the plurality of microstructures define a top plane and bases of the plurality of microstructures define a base plane. The substantially vertical channel surface definesa wall of a channel of the plurality of channels and the channel surface defines a channel plane. The offset surface includes a nonplanar portion of displaced material. The displaced material definesa displacement plane that is below the base plane or within a tolerance of the top plane. 一种制品包括抛光层，该抛光层包括由多个通道分隔的多个凸起单元。该多个凸起单元中的每个包括：微结构化工作表面；基本上竖直的通道表面；以及偏移表面，该偏移表面位于工作表面的边缘与通道表面的上边缘之间。微结构化工作表面包括多个微结构。该多个微结构的顶部限定顶部平面，并且该多个微结