Layout structure of substrate isolation ring
The invention discloses a layout structure of a substrate isolating ring. The layout structure comprises a closed or unclosed N-well isolating ring formed by connecting a plurality of N-well isolatingring units with the same or different lengths end to end, and a closed or unclosed P-well isolating...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a layout structure of a substrate isolating ring. The layout structure comprises a closed or unclosed N-well isolating ring formed by connecting a plurality of N-well isolatingring units with the same or different lengths end to end, and a closed or unclosed P-well isolating ring formed by connecting a plurality of P-well isolating ring units with the same or different lengths end to end. The substrate isolation ring unit adopted by the invention can be repeatedly applied to various scenes in layout design, completely meets the process design specification, improves the layout design efficiency of an integrated circuit, and reduces the pressure of layout designers on compressing the product tape-out time.
本发明公开了一种衬底隔离环的版图结构,版图结构包括:由多个长度相同或不同的N阱隔离环单元首尾相连构成的封闭或不封闭的N阱隔离环和由多个长度相同或不同的P阱隔离环单元首尾相连构成的封闭或不封闭的P阱隔离环。本发明采用的衬底隔离环单元可以重复应用在版图设计中的各个场景,并且完全满足工艺设计规范,提高集成电路版图设计的效率,减轻版图设计人员的压缩产品流片时间的压力。 |
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