Sintered compact, sputtering target and method for producing sintered compact

The invention provides a sintered compact that can have appropriate mechanical strength, effectively reduced bulk resistance, and suppressed occurrence of abnormal discharge, a sputtering target and amethod for producing the sintered compact. The sintered compact contains oxides of In, Ga and Zn, an...

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Bibliographische Detailangaben
Hauptverfasser:	KAKUTA KOJI, HIDESHIMA MASAAKI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	The invention provides a sintered compact that can have appropriate mechanical strength, effectively reduced bulk resistance, and suppressed occurrence of abnormal discharge, a sputtering target and amethod for producing the sintered compact. The sintered compact contains oxides of In, Ga and Zn, and meets relationships that 0.317 < In/(In+Ga+Zn)