Damage-free high-planarity monocrystalline silicon carbide planar optical element and preparation method thereof
The invention discloses a damage-free high-planarity monocrystalline silicon carbide planar optical element and a preparation method thereof. The preparation method comprises the following steps: (1)selecting a whole single crystal silicon carbide crystal ingot with a zero micro-pipeline; (2) cuttin...
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| creator | SHI ERWEI ZHUO SHIYI CHEN HUI XIN JUN HUANG WEI KONG HAIKUAN WANG LEXING |
| description | The invention discloses a damage-free high-planarity monocrystalline silicon carbide planar optical element and a preparation method thereof. The preparation method comprises the following steps: (1)selecting a whole single crystal silicon carbide crystal ingot with a zero micro-pipeline; (2) cutting the single crystal silicon carbide crystal ingot to obtain a rough blank; (3) carrying out double-sided grinding on the rough blank to obtain two parallel rough grinding surfaces; (4) polishing the two parallel rough grinding surfaces to obtain an optical mirror surface; and (5) carrying out chemical mechanical polishing on the optical mirror surface, removing a damaged layer of the mirror surface, and carrying out local finishing to obtain the damage-free high-planarity monocrystalline silicon carbide planar optical element.
本发明公开一种无损伤、高平面度单晶碳化硅平面光学元件及其制备方法。所述制备方法包括以下步骤：（1）挑选零微管道的整块单晶碳化硅晶锭；（2）对该单晶碳化硅晶锭进行切割，得到粗坯；（3）对粗坯进行双面研磨，得到两个平行的粗磨面；（4）对两个平行的粗磨面进行抛光，得到光学镜面；（5）对光学镜面进行化学机械抛光，去除镜面的损伤层，并进行局部修整，得到无损伤、高平面度单晶碳化硅平面光学元 |
| format | Patent |
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本发明公开一种无损伤、高平面度单晶碳化硅平面光学元件及其制备方法。所述制备方法包括以下步骤：（1）挑选零微管道的整块单晶碳化硅晶锭；（2）对该单晶碳化硅晶锭进行切割，得到粗坯；（3）对粗坯进行双面研磨，得到两个平行的粗磨面；（4）对两个平行的粗磨面进行抛光，得到光学镜面；（5）对光学镜面进行化学机械抛光，去除镜面的损伤层，并进行局部修整，得到无损伤、高平面度单晶碳化硅平面光学元</description><language>chi ; eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200327&DB=EPODOC&CC=CN&NR=110919465A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200327&DB=EPODOC&CC=CN&NR=110919465A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHI ERWEI</creatorcontrib><creatorcontrib>ZHUO SHIYI</creatorcontrib><creatorcontrib>CHEN HUI</creatorcontrib><creatorcontrib>XIN JUN</creatorcontrib><creatorcontrib>HUANG WEI</creatorcontrib><creatorcontrib>KONG HAIKUAN</creatorcontrib><creatorcontrib>WANG LEXING</creatorcontrib><title>Damage-free high-planarity monocrystalline silicon carbide planar optical element and preparation method thereof</title><description>The invention discloses a damage-free high-planarity monocrystalline silicon carbide planar optical element and a preparation method thereof. The preparation method comprises the following steps: (1)selecting a whole single crystal silicon carbide crystal ingot with a zero micro-pipeline; (2) cutting the single crystal silicon carbide crystal ingot to obtain a rough blank; (3) carrying out double-sided grinding on the rough blank to obtain two parallel rough grinding surfaces; (4) polishing the two parallel rough grinding surfaces to obtain an optical mirror surface; and (5) carrying out chemical mechanical polishing on the optical mirror surface, removing a damaged layer of the mirror surface, and carrying out local finishing to obtain the damage-free high-planarity monocrystalline silicon carbide planar optical element.
本发明公开一种无损伤、高平面度单晶碳化硅平面光学元件及其制备方法。所述制备方法包括以下步骤：（1）挑选零微管道的整块单晶碳化硅晶锭；（2）对该单晶碳化硅晶锭进行切割，得到粗坯；（3）对粗坯进行双面研磨，得到两个平行的粗磨面；（4）对两个平行的粗磨面进行抛光，得到光学镜面；（5）对光学镜面进行化学机械抛光，去除镜面的损伤层，并进行局部修整，得到无损伤、高平面度单晶碳化硅平面光学元</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjsKwkAQBuA0FqLeYTxAwOADUkpUrKzsw7j5kx3YF7vT5PYKegCrr_mWVbqw5wn1mAGyMtk6OQ6cRWfyMUST56LsnARQEScmBjKcXzKAvpNiUjHsCA4eQYnDQCkjcWaVT_dQGwdSi4w4rqvFyK5g83NVbW_XZ3evkWKPktggQPvu0TS7tmkPp-N5_895A8AmRCY</recordid><startdate>20200327</startdate><enddate>20200327</enddate><creator>SHI ERWEI</creator><creator>ZHUO SHIYI</creator><creator>CHEN HUI</creator><creator>XIN JUN</creator><creator>HUANG WEI</creator><creator>KONG HAIKUAN</creator><creator>WANG LEXING</creator><scope>EVB</scope></search><sort><creationdate>20200327</creationdate><title>Damage-free high-planarity monocrystalline silicon carbide planar optical element and preparation method thereof</title><author>SHI ERWEI ; ZHUO SHIYI ; CHEN HUI ; XIN JUN ; HUANG WEI ; KONG HAIKUAN ; WANG LEXING</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN110919465A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SHI ERWEI</creatorcontrib><creatorcontrib>ZHUO SHIYI</creatorcontrib><creatorcontrib>CHEN HUI</creatorcontrib><creatorcontrib>XIN JUN</creatorcontrib><creatorcontrib>HUANG WEI</creatorcontrib><creatorcontrib>KONG HAIKUAN</creatorcontrib><creatorcontrib>WANG LEXING</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHI ERWEI</au><au>ZHUO SHIYI</au><au>CHEN HUI</au><au>XIN JUN</au><au>HUANG WEI</au><au>KONG HAIKUAN</au><au>WANG LEXING</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Damage-free high-planarity monocrystalline silicon carbide planar optical element and preparation method thereof</title><date>2020-03-27</date><risdate>2020</risdate><abstract>The invention discloses a damage-free high-planarity monocrystalline silicon carbide planar optical element and a preparation method thereof. The preparation method comprises the following steps: (1)selecting a whole single crystal silicon carbide crystal ingot with a zero micro-pipeline; (2) cutting the single crystal silicon carbide crystal ingot to obtain a rough blank; (3) carrying out double-sided grinding on the rough blank to obtain two parallel rough grinding surfaces; (4) polishing the two parallel rough grinding surfaces to obtain an optical mirror surface; and (5) carrying out chemical mechanical polishing on the optical mirror surface, removing a damaged layer of the mirror surface, and carrying out local finishing to obtain the damage-free high-planarity monocrystalline silicon carbide planar optical element.
本发明公开一种无损伤、高平面度单晶碳化硅平面光学元件及其制备方法。所述制备方法包括以下步骤：（1）挑选零微管道的整块单晶碳化硅晶锭；（2）对该单晶碳化硅晶锭进行切割，得到粗坯；（3）对粗坯进行双面研磨，得到两个平行的粗磨面；（4）对两个平行的粗磨面进行抛光，得到光学镜面；（5）对光学镜面进行化学机械抛光，去除镜面的损伤层，并进行局部修整，得到无损伤、高平面度单晶碳化硅平面光学元</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | Damage-free high-planarity monocrystalline silicon carbide planar optical element and preparation method thereof |
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