A processing device, a processing system and a processing method

The invention provides a processing device, a processing system and a processing method. The present invention provides a technique for suppressing the detachment of foreign matters from a filter whenthe use of the filter is started when filtering a liquid with a high viscosity. The processing devic...

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Bibliographische Detailangaben
Hauptverfasser:	HIROKI MIZUNO, TAKESHI KAWAKAMI, ETO TAKASUKE, JUNICHI GOTO, MIKIYA HIROSE, YOSHIKAWA NORIO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SEPARATION TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention provides a processing device, a processing system and a processing method. The present invention provides a technique for suppressing the detachment of foreign matters from a filter whenthe use of the filter is started when filtering a liquid with a high viscosity. The processing device is a processing device for processing the filter for filtering a high-viscosity processing liquid. The processing device includes: a circulation pipe to circulate the processing liquid; a liquid supply mechanism to cause the processing liquid to flow in the circulation pipe; and an installation mechanism and a foreign matter removal filter to be inserted in the flow path of the circulation pipe. The installation mechanism detachably installs the filter. If the processing device as described above is used to perform the aging treatment of the filter, the processing liquid is recycled, and the consumption of the processing liquid can be reduced. Furthermore, a separate device from the device to which the filter is