Low-melting-point high-flowability ternary random copolymer polyamide modified base material resin and preparation method thereof

The invention discloses a low-melting-point high-flowability ternary random copolymer polyamide modified base material resin and a preparation method thereof. The preparation method comprises the following steps: (1) carrying out a mixed reaction on X mole hexamethylenediamine, X mole adipic acid an...

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Hauptverfasser: WANG XIAOHUA, ZHANG RIDONG, YE TING, YAO ZENGWEN, SHAO JIJUN, YANG XIAONA
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a low-melting-point high-flowability ternary random copolymer polyamide modified base material resin and a preparation method thereof. The preparation method comprises the following steps: (1) carrying out a mixed reaction on X mole hexamethylenediamine, X mole adipic acid and water to obtain a polyamide salt solution A, carrying out a mixed reaction on Y mole diamine witha long carbon band branched chain, Y mole adipic acid or hexamethylenediamine and water to obtain a polyamide salt solution B, mixing Z mole caprolactam and desalted water to obtain a caprolactam solution C, and mixing the polyamide salt solution A, the polyamide salt solution B and the caprolactam solution C to obtain a mixed polyamide salt solution; and (2) carrying out evaporation concentration, polymerization and granulation, and adding an antioxidant and a flowability improver to obtain the low-melting-point high-flowability ternary random copolymer polyamide modified base material resin.The molecular chain regul