Preparation method of photolithographic layer mask and ion implantation method

The invention provides a preparation method of a photolithographic layer mask and an ion implantation method. The auxiliary pattern is added on a photolithographic layer mask plate above an active region, light intensity distribution of a region above the active region and needing to reduce light tr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HE DAQUAN, ZHU JUN, LYU YUKUN, ZHANG XUSHENG, QI XUERUI, DING LIHUA, WEI FANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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