Apparatus for generating extreme ultraviolet radiation
An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets usingexcitation pulses to convert the target droplets to plasma. An energy detector is configured to meas...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets usingexcitation pulses to convert the target droplets to plasma. An energy detector is configured to measure a variation in EUV energy generated when the target droplets are converted to plasma. A feedback controller is configured to adjust parameters of the droplet generator and/or the excitation laser based on the variation in EUV energy.
一种产生极紫外光(Extreme Ultraviolet;EUV)辐射的装置,此装置包含液滴产生器、激发激光、能量侦测器与反馈控制器。液滴产生器是配置以产生目标液滴。激发激光是配置以使用激发脉冲加热此些目标液滴,以将目标液滴转换为电浆。当目标液滴转换为电浆时,能量侦测器是配置以量测极紫外光能量中所产生的变化。反馈控制器是配置以基于极紫外光能量中的变化来调整液滴产生器及/或激发激光的参数。 |
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