Seven-cavity vertical type HWCVD-PVD integrated silicon wafer coating production process

The invention relates to a seven-cavity vertical type HWCVD-PVD integrated silicon wafer coating production process. A preheating feed cavity, an intrinsic amorphous silicon thin film deposition HWCVDcavity, a doped amorphous silicon thin film deposition HWCVD cavity, first, second and third TCO thi...

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Bibliographische Detailangaben
Hauptverfasser:	REN DONGLIANG, HUANG HAIBIN, ZHOU LANG, HUANG ZHEN, PENG DEXIANG, LIU CHAO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a seven-cavity vertical type HWCVD-PVD integrated silicon wafer coating production process. A preheating feed cavity, an intrinsic amorphous silicon thin film deposition HWCVDcavity, a doped amorphous silicon thin film deposition HWCVD cavity, first, second and third TCO thin film deposition PVD cavities and a discharge cavity are connected sequentially through vacuum locks, the head and the tail are provided with the vacuum locks, and a movable device connect all the cavities from front to back in a penetrating mode. A vertical type bearing plate is arranged in the preheating feed cavity, is arranged on the movable device and is in a movable state from front to back in integrated equipment. A sputtering target is arranged in the second TCO thin film deposition PVD cavity. All the cavities are externally connected with a hyperpure gas channel, a heating system and a vacuum-pumping system. Procedures can be effectively prevented from being exposed to air in theproduct preparation proce