SUBSTRATE ROTATION DEVICE, SUBSTRATE CLEANING DEVICE, SUBSTRATE PROCESSING DEVICE, AND CONTROL METHOD FOR SUBSTRATE ROTATION DEVICE

The invention provides an advanced substrate rotation device, a substrate cleaning device, a substrate processing device, and a control method for the substrate rotation device. The substrate rotationdevice is disclosed. The substrate rotation device includes an outer cylinder, an inner cylinder pos...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SATOH ICHIJU, BARADA TOSHIMITSU
Format: Patent
Sprache:chi ; eng
Schlagworte:
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