SUBSTRATE ROTATION DEVICE, SUBSTRATE CLEANING DEVICE, SUBSTRATE PROCESSING DEVICE, AND CONTROL METHOD FOR SUBSTRATE ROTATION DEVICE
The invention provides an advanced substrate rotation device, a substrate cleaning device, a substrate processing device, and a control method for the substrate rotation device. The substrate rotationdevice is disclosed. The substrate rotation device includes an outer cylinder, an inner cylinder pos...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides an advanced substrate rotation device, a substrate cleaning device, a substrate processing device, and a control method for the substrate rotation device. The substrate rotationdevice is disclosed. The substrate rotation device includes an outer cylinder, an inner cylinder positioned inside the outer cylinder, a motor for rotating the inner cylinder, a magnetic bearing formagnetically levitating the inner cylinder, and a substrate holder disposed on the inner cylinder. The motor is a radial motor including a motor stator mounted on the outer cylinder, and a motor rotormounted on the inner cylinder. The magnetic bearing is a radial magnetic bearing including a magnetic bearing stator mounted on the outer cylinder, and a magnetic bearing rotor mounted on the inner cylinder. The magnetic bearing is configured to magnetically levitate the inner cylinder with an attractive force between the magnetic bearing stator and the magnetic bearing rotor.
本发明提供一种进步的基板旋转装置、基板清洗装置、基板处理装置以及基板旋转装置的控制方法。该基 |
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