Detergent and method for cleaning semiconductor silicon wafer by using detergent

The invention discloses a detergent with a good cleaning effect. The detergent comprises a reagent I, a reagent II, a reagent III and a reagent IV, wherein the reagent I is a mixed solution of propylene glycol or isopropyl alcohol, nonylphenol polyoxyethylene ether, trans-1,2-ethylene dichloride and deionized water which are in a volume ratio of 3: 1: 2: 3; the reagent II is a mixed solution of sulfuric acid and hydrogen peroxide which are in a volume ratio of 4: 1; the reagent III is a mixed solution of ammonium hydroxide, hydrogen peroxide and deionized water which are in a volume ratio of 1: 1: 5; and the reagent IV is a mixed solution of hydrofluoric acid, hydrogen peroxide and deionized water which are in a volume ratio of 3: 1: 1,000. The invention simultaneously discloses a method for cleaning a semiconductor silicon wafer by using the detergent. 本发明公开了一种具有良好清洗效果的清洗剂，其包括：试剂一：体积比为3:1:2:3的丙二醇或异丙醇、壬基酚聚氧乙烯醚、反-1,2-二氯乙烯、去离子水混合溶液；试剂二：体积比为4:1的硫酸、双氧水混合溶液；试剂三：体积比为1:1:5的氢氧化铵、双氧水、去离子水混合溶液；试剂四：体积比为3:1:1000的氢氟酸、双氧水、