Substrate processing apparatus and substrate processing method

The present invention provides a technique capable of suppressing a pattern collapse of a concavo-convex pattern when drying a liquid film which covers the concavo-convex pattern. The substrate processing apparatus includes: a substrate holder configured to hold a substrate with a surface of the sub...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	IKEDA BOUI, IWANAGA KAZUYA, HAYASHI MASATO, HIDAKA SHOICHIRO, SEKIMOTO EIICHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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