Support table, support table assembly, processing arrangement, and methods thereof

The present invention discloses a support table, a support table assembly, a processing arrangement, and methods thereof. According to various embodiments, a support table (100) may include: a baseplate (102) including a support structure (104), the support structure (104) defining a support region...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MARKUS OTTOWITZ, DANIEL BRUNNER, BERNHARD GOLLER, LUKAS FERLAN, WALTER LEITGEB
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention discloses a support table, a support table assembly, a processing arrangement, and methods thereof. According to various embodiments, a support table (100) may include: a baseplate (102) including a support structure (104), the support structure (104) defining a support region over the baseplate (102) to support at least one of a workpiece or a workpiece carrier (200) therein; and one or more light-emitting components (106) disposed between the baseplate (102) and the support region (104r). The one or more light-emitting components (106r) are configured to emit light intothe support region (104r). 公开了支承台、支承台组装、处理装置及其方法。根据各种实施例,支承台(100)可以包括:基板(102),其包括支承结构(104),支承结构(104)限定在基板(102)上方的支承区(104r)以在其中支承工件或者工件载体(200)中的至少一个;以及一个或多个发光组件(106),其被部署在基板(102)和支承区(104r)之间,其中一个或多个发光组件(106r)被配置为将光发射到支承区(104r)中。