MULTI-STAGE RESIN SURFACE ETCHING METHOD, AND PLATING METHOD ON RESIN USING SAME

The present invention provides a resin surface etching method characterized in that, in etching a resin surface, one set of steps (a) and (b), is performed two or more times without performing a resinswelling step, wherein step (a) is a step for treating the resin surface with a solution containing an oxidizing agent and adsorbing the oxidizing agent on the resin surface, and step (b) is a step for activating the oxidizing agent adsorbed on the resin surface in step (a). This rein surface etching method provides a novel technique operable at an industrial level, as a resin etching technique that does not use a chromic acid. 本发明提供一种树脂表面的蚀刻方法，其是不使用铬酸的树脂的蚀刻技术，是能够以工业水平运用的新技术，其特征在于，在蚀刻树脂表面时，不进行树脂的溶胀工序，将以下工序(a)和(b)作为1组，将其进行2组以上。(a)用含有氧化剂的溶液进行处理，使氧化剂吸附于树脂表面的工序；(b)使工序(a)中吸附于树脂表面的氧化剂活化的工序。