After-sun repair mask and preparation method thereof

The invention discloses an after-sun repair mask and a preparation method thereof. The after-sun repair mask comprises components in percentage by weight as follows: 0.01%-2% of a thickener, 0.1%-15%of a moisturizer, 0.1%-18% of an emollient, 0.1%-2% of an anti-allergy agent, 0.1%-0.5% of an anti-inflammatory agent, 0.1%-20% of a skin conditioner, 1%-2.3% of a preservative and the balance of purified water. The invention further provides the preparation method of the after-sun repair mask. The mask components are all safe, effective and pollution-free raw materials, no hormone is added, all the components are stable, the preparation process is simple and easy to control, preparation of the mask can be completed quickly, problems of potential safety risk and component instability are solved effectively, and multiple skin problems such as skin melanin pigmentation, hair loss, inflammation, redness and allergy can be solved. 本发明公开了一种晒后修复面膜及其制备方法，晒后修复面膜包括以下重量百分比组分：增稠剂0.01～2％、保湿剂0.1～15％、润肤剂0.1～18％、抗敏剂0.1～2％、抗炎剂0.1