VACUUM PROCESSING DEVICE

The purpose of the present invention is, in a pass-through type vacuum processing device that uses a plurality of substrate holders, to perform processing on both surfaces of substrates with excellentefficiency, and achieve reduction in size and simplification in constitution of the device. A transport path has an outbound path side transport unit 33a for transporting each of the substrate holders 11 in a first transport direction P1 in a horizontal state, a return path side transport unit 33c for transport in a second transport direction P2 reverse of the first transport direction P1, and atransport turning unit 30B for turning from the outbound path side transport unit 33a to the return path side transport unit 33c. The substrate holders 11 are transported by a first drive unit 36 of asubstrate holder transport mechanism 3. A direction switching mechanism 40 having a second drive unit 46 is provided in proximity to the transport turning unit 30B. The first drive unit 36 of the substrate holder transport mec