Substrate treatment device and substrate treatment method

The substrate treatment device according to an embodiment of the present invention is provided with a liquid treatment unit, an image pickup unit (41), a determination unit (19b), and a post-treatmentunit. The liquid treatment unit supplies a liquid to form a liquid film on a substrate. The image pickup unit (41) captures an image of a surface of the substrate having the liquid film formed thereon. The determination unit (19b) determines, on the basis of the captured image of the substrate, whether the formation condition of the liquid film is good or bad. When it is determined that the formation condition of the liquid film is good, the post-treatment unit treats the substrate having the liquid film formed thereon. 实施方式所涉及的基板处理装置具备液处理部、摄像部(41)、判定部(19b)以及后处理部。液处理部向基板供给液体来在基板形成液膜。摄像部(41)拍摄形成有液膜的基板的表面。判定部(19b)基于拍摄到的基板的图像，来判定液膜的形成状态是否良好。在判定为液膜的形成状态良好的情况下，后处理部对形成有液膜的基板进行处理。