Apparatus for and method of controlling debris in EUV light source

Disclosed is an EUV system in which a source control loop is established to maintain and optimize debris flux while not unduly affecting optimum EUV generation conditions. One or more temperature sensors, e.g., thermocouples may be installed in the vessel to measure respective local gas temperatures. The respective local temperature as measured by the one or more thermocouples can be used as one or more inputs to the source control loop. The source control loop may then adjust the laser targeting to permit optimization of debris generation and deposition while not affecting EUV production, thus extending the lifetime of the source and its collector. 公开了一种EUV系统，其中，建立了源控制回路以维持和优化碎片通量，同时不会过度影响最佳EUV生成条件。可以在容器中安装一个或多个温度传感器，例如热电偶，以测量相应局部气体温度。由所述一个或多个热电偶测量的相应局部温度可用作所述源控制回路的一个或多个输入。随后，所述源控制回路可以调整激光瞄准，以准许碎片的生成和沉积的优化，同时不影响EUV产生，由此延长源及其收集器的使用寿命。