Tank body integral structure for wafer washing
The invention discloses a tank body integral structure for wafer washing. The structure comprises a washing tank, and an outer tank is arranged at the inner side of the washing tank; an inner groove is formed in the inner side of an outer groove; a wafer box for loading a wafer is arranged in the in...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a tank body integral structure for wafer washing. The structure comprises a washing tank, and an outer tank is arranged at the inner side of the washing tank; an inner groove is formed in the inner side of an outer groove; a wafer box for loading a wafer is arranged in the inner groove; a supporting frame is installed at the bottom of the inner side of the inner groove, andthe wafer box is fixedly installed on the supporting frame; an ultrasonic groove is formed below the inner groove, and two upper cover plates are arranged at a groove opening in the upper portion ofthe outer groove; a liquid inlet pipe sequentially penetrates through the outer groove and the inner groove from outside to inside, a first liquid discharging pipe is communicated with the inner groove, and a second liquid discharging pipe is communicated with the outer groove. The wafer cleaning effect is good, the structure is compact, the installation space in the washing tank is reasonably distributed, the size of the |
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