Photoresist stripper composition for preventing stain and preparing method of flat plate panel substrate

The invention discloses a photoresist stripper composition for preventing a stain and a preparing method of a flat plate panel substrate, wherein the photoresist stripper composition comprises the components of: (a) glycol ether which is represented by a chemical formula 1; (b) alkaline compound; (c...

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Hauptverfasser: SHIN HYE-RA, KO KYUNG-JUN, LEE YU-JIN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a photoresist stripper composition for preventing a stain and a preparing method of a flat plate panel substrate, wherein the photoresist stripper composition comprises the components of: (a) glycol ether which is represented by a chemical formula 1; (b) alkaline compound; (c) aprotic polar solvent; and (d) corrosion inhibitor: R-(OCH2CH2)n-OH (1), wherein R is methyl or ethyl, and n is an integer selected from 2 and 3, wherein the glycol ether has an octanol/water distribution coefficient (LogP) calculated through an equation 1: Kow=Co/Cw, wherein Co represents soluteconcentration in octanol, Cw represents solute concentration in water, and LogP (distribution coefficient)=Log(Kow). 本发明公开了一种防止污渍的光刻胶剥离剂组合物以及一种制造平板显示器基板的方法,所述光刻胶剥离剂组合物包含:(a)由下面的化学式1所表示的二醇醚;(b)碱性化合物;(c)非质子性极性溶剂;以及(d)抗腐蚀剂:R-(OCHCH)n-OH(1)其中,R是甲基或乙基,且n是2或3的整数,其中,所述二醇醚具有由下面的等式1计算出的负值的辛醇/水分配系数(LogP):Kow=Co/CwCo:溶质在辛醇中的浓度Cw:溶质在水中的浓度LogP(分配系数)=Log(Kow)。